This volume presents a coherent synopsis of a rapidly evolving field. Subjects covered include diffraction contrast and defect analysis by conventional TEM lattice imaging, phase contrast and resolution limits in high resolution electron microscopy. Specialized electron diffraction techniques are also covered, as is the application of parallel electron energy loss spectroscopy and scanning transmission EM for subnanometer analysis. Materials analyzed include thin films, interfaces and non-conventional materials. WDS and EDS are treated, with an emphasis on o(pZ) techniques for the analysis of thin layers and surface films. Theoretical and practical aspects of ESEM are discussed in relation to applications in crystal growth, biomaterials and polymers. Developments in SPM are also described.
Edited by:
David G. Rickerby, Giovanni Valdrè, Ugo Valdrè Imprint: Springer Edition: Softcover reprint of the original 1st ed. 1999 Volume: 364 Dimensions:
Height: 240mm,
Width: 160mm,
Spine: 26mm
Weight: 1.580kg ISBN:9780792359401 ISBN 10: 0792359402 Series:NATO Science Series E: Pages: 489 Publication Date:30 September 1999 Audience:
College/higher education
,
Professional and scholarly
,
Further / Higher Education
,
Undergraduate
Format:Paperback Publisher's Status: Active