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An Introduction to Time-of-Flight Secondary Ion Mass Spectrometry

ToF-SIMS and its Application to Materials Science

Sarah Fearn

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Hardback

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English
Morgan & Claypool Publishers
30 October 2015
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
By:  
Imprint:   Morgan & Claypool Publishers
Country of Publication:   United States
ISBN:   9781643279107
ISBN 10:   1643279106
Series:   IOP Concise Physics
Pages:   66
Publication Date:  
Audience:   General/trade ,  ELT Advanced
Format:   Hardback
Publisher's Status:   Active
Introduction Practical Requirements Modes of Analysis Ion Beam – Target Interactions Application to Materials Science

Dr. Sarah Fearn is a Research Officer, Surface Analysis in the Materials Department at Imperial College London, where she conducts near- surface analysis of SOFCs and ionic conductivity measurements on nano-engineered structures. Her current research techniques include: isotope exchange, secondary ion mass spectrometry (SIMS), focused ion beam (FIB) microscopy, and low-energy ion scattering (LEIS). She received her PhD in 1999 from Imperial College London and spent nearly two years as a commercial SIMS analyst with Cascade Scientific before joining ICL in 2002.

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